Reactive deposition of tin films using an unbalanced magnetron
- 15 December 1989
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 39-40, 487-497
- https://doi.org/10.1016/s0257-8972(89)80010-6
Abstract
No abstract availableKeywords
This publication has 16 references indexed in Scilit:
- Reactive deposition of hard coatingsSurface and Coatings Technology, 1989
- Activation of reactive sputtering by a plasma beam from an unbalanced magnetronVacuum, 1988
- Properties of ion-plated TiN coatings grown at low temperaturesSurface and Coatings Technology, 1988
- High Temperature microhardness of hard coatings produced by physical and chemical vapor depositionThin Solid Films, 1987
- Microstructure and physical properties of polycrystalline metastable Ti0.5Al0.5N alloys grown by d.c. magnetron sputter depositionThin Solid Films, 1987
- Observations on the operation of a planar magnetron sputtering system by target erosion patternsThin Solid Films, 1987
- Hollow-cathode-enhanced magnetron sputteringJournal of Vacuum Science & Technology A, 1986
- Charged particle fluxes from planar magnetron sputtering sourcesJournal of Vacuum Science & Technology A, 1986
- Magnetron sputtering with additional ionization effect by electron beamJournal of Vacuum Science and Technology, 1982
- High rate deposition of thick piezoelectric ZnO films using a new magnetron sputtering techniqueApplied Physics Letters, 1980