The effect of N2 partial pressure, deposition rate and substrate bias potential on the hardness and texture of reactively sputtered TiN coatings
- 1 December 1989
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 39-40, 355-363
- https://doi.org/10.1016/0257-8972(89)90068-6
Abstract
No abstract availableThis publication has 20 references indexed in Scilit:
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