The residual stress in TiN films deposited onto cemented carbide by high-rate reactive sputtering
- 1 December 1989
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 39-40, 387-395
- https://doi.org/10.1016/0257-8972(89)90071-6
Abstract
No abstract availableThis publication has 17 references indexed in Scilit:
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