Plasma deposited carbon films as a possible means for divertor repair
- 1 May 1992
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 212 (1-2) , 282-296
- https://doi.org/10.1016/0040-6090(92)90534-i
Abstract
No abstract availableKeywords
This publication has 15 references indexed in Scilit:
- Analysis of the Evolution of a Supersonically Expanding PlasmaContributions to Plasma Physics, 1991
- Important announcementPlasma Chemistry and Plasma Processing, 1990
- Fast deposition of amorphous hydrogenated carbon films using a supersonically expanding arc plasmaPlasma Chemistry and Plasma Processing, 1990
- A Diagnostic Device for Beam Profile Measurements of Pulsed High Power Solid State LasersPublished by Springer Nature ,1990
- Graphite formation in diamond film depositionJournal of Vacuum Science & Technology A, 1989
- Surface characterization of various graphites by x‐ray photoelectron, secondary ion mass, and Raman spectroscopiesJournal of Vacuum Science & Technology A, 1988
- The growth of diamond in microwave plasma under low pressureJournal of Materials Science, 1987
- Amorphous carbonAdvances in Physics, 1986
- First- and second-order Raman scattering from finite-size crystals of graphitePhysical Review B, 1979
- The structure of the crack network in amorphous filmsThin Solid Films, 1977