Activation Energy of Holes in Zn-Doped GaAs
- 15 March 1970
- journal article
- conference paper
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 41 (4) , 1815-1818
- https://doi.org/10.1063/1.1659109
Abstract
The Hall effect and resistivity have been measured as a function of temperature for lightly Zn‐doped GaAs of better quality than previously available. Analysis of the Hall coefficient data yields activation energies which change with doping level. These results, along with earlier results on more heavily doped samples, can be represented by EA=0.0308−2.34×10−8(NIA)1/3 eV. The Hall mobility as a function of temperature leads to μL=400(300/T)2.41 for the lattice mobility of p‐type GaAs.This publication has 14 references indexed in Scilit:
- A photoluminescence study of acceptor centres in gallium arsenideBritish Journal of Applied Physics, 1967
- Electrical Properties of n‐Type Epitaxial Gallium ArsenidePhysica Status Solidi (b), 1966
- Infrared Transmission and Fluorescence of Doped Gallium ArsenidePhysical Review B, 1964
- Analysis of Lattice and Ionized Impurity Scattering in-Type GermaniumPhysical Review B, 1962
- Scattering of Electrons by Lattice Vibrations in Nonpolar CrystalsPhysical Review B, 1956
- Lattice-Scattering Mobility of Holes in GermaniumPhysical Review B, 1956
- Electrical Properties of Silicon Containing Arsenic and BoronPhysical Review B, 1954
- Electrical Properties of-Type GermaniumPhysical Review B, 1954
- Lattice-Scattering Mobility in GermaniumPhysical Review B, 1954
- Electrical Properties of Pure Silicon and Silicon Alloys Containing Boron and PhosphorusPhysical Review B, 1949