Characterization of α-Fe2O3 thin films processed by plasma enhanced chemical vapor deposition (PECVD)
- 1 March 1999
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 341 (1-2) , 73-78
- https://doi.org/10.1016/s0040-6090(98)01530-2
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- Preparation and gas-sensing properties of α-Fe2O3 thin filmsJournal of Electronic Materials, 1995
- H2 sensors using Fe2O3-based thin filmSensors and Actuators B: Chemical, 1994
- Change of ferric oxide (Fe2O3) semiconductor conductivity type in the interaction with reducing gasesSensors and Actuators B: Chemical, 1992
- Characteristics of α-Fe2O3 thick film gas sensorsThin Solid Films, 1991
- Enhancement of Gas Sensitivity by Controlling Microstructure of α–Fe2O3 CeramicsJapanese Journal of Applied Physics, 1983
- Effects of Sulfate Ion on Gas Sensitive Properties of α-Fe2O3 CeramicsJapanese Journal of Applied Physics, 1982
- Reactive Condensation and Magnetic Properties of Iron Oxide FilmsJapanese Journal of Applied Physics, 1978
- Magnetite thin filmsIEEE Transactions on Magnetics, 1972
- A New Detector for Gaseous Components Using Semiconductive Thin Films.Analytical Chemistry, 1962