Reluctant etchability of dielectric Al2O3 films sputtered in water vapor and ArO2 environments
- 1 July 1991
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 202 (1) , 83-89
- https://doi.org/10.1016/0040-6090(91)90544-8
Abstract
No abstract availableKeywords
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