Rutherford backscattering spectroscopy and electron microprobe analyses of argon gas trapped in alumina thin films
- 9 January 1989
- journal article
- conference paper
- Published by AIP Publishing in Applied Physics Letters
- Vol. 54 (2) , 129-130
- https://doi.org/10.1063/1.101439
Abstract
Rf‐sputtered aluminum oxide thin films were analyzed for argon content using electron microprobe analysis (EMPA). Standardless Rutherford backscattering spectroscopy was performed on several Al2O3 films, and these data were used as calibration standards in EMPA. EMPA performed at 10 keV with two separate film standards gave reproducible trends; the estimated error in the EMPA argon analysis was calculated to be ±0.8 wt. % at 10 keV and ±1.4 wt. % at 5 keV.Keywords
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