Silver distribution in wet-sensitized As10Ge22.5Se67.5 films after electron beam exposure

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Abstract
In photodoping, it is well known that the silver concentration of the exposed region is somewhat higher at the edge than at its interior. This is termed the ‘‘edge sharpening’’ effect. Exposure by electrons or ions has been reported to produce no such effect, which leads to the conjecture that it might be dependent on the kind of irradiation involved. However, we have shown here by electron probe microbeam analysis, without ambiguity, that the edge‐sharpening effect does occur in regions of a chalcogenide glass film As10Ge22.5Se67.5 that is coated with silver selenide and exposed by electrons of 25 keV. Furthermore, we have observed, for the first time, that silver concentration at the periphery of the exposed region increases with dosage. It has then been shown that such a silver distribution is not due to the temperature gradient of a highly focused electron beam. Finally, exposure by electron beam has been found to induce surface‐topological changes in the exposed regions at a dosage of about 1 C/cm2, which is similar to photoinduced surface‐topological changes studied recently. These characteristics have an important effect on patterning in the submicron range by electron beam lithography using the induced silver doping effect.

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