Atomic layer controlled deposition of SiO2 and Al2O3 using ABAB… binary reaction sequence chemistry
- 1 December 1994
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 82-83, 460-467
- https://doi.org/10.1016/0169-4332(94)90259-3
Abstract
No abstract availableThis publication has 38 references indexed in Scilit:
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