Plasma spectroscopy control and analysis of a-Si:H deposition
- 29 February 1980
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 35-36, 183-188
- https://doi.org/10.1016/0022-3093(80)90591-8
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Doping, Schottky barrier and pn junction formation in amorphous germanium and silicon by rf sputteringSolid State Communications, 1976
- R.F. sputteringThin Solid Films, 1970
- The Preparation and Properties of Amorphous SiliconJournal of the Electrochemical Society, 1969