Depth profiling and diffusion of 22Ne implanted in tantalum by (p, γ) resonance broadening

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15 May 1983

journal article
Published by Elsevier in Nuclear Instruments and Methods in Physics Research

Vol. 209-210, 889-893
https://doi.org/10.1016/0167-5087(83)90895-5

Abstract

No abstract available

Keywords

This publication has 7 references indexed in Scilit:

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