Selective Si and SiGe epitaxial heterostructures grown using an industrial low-pressure chemical vapor deposition module
- 1 May 1997
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 15 (3) , 712-718
- https://doi.org/10.1116/1.589374
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
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