Improvement of Total Reflection X-ray Fluorescence (TXRF) spectrochemical analysis for silicon wafers
- 1 July 1997
- journal article
- Published by Elsevier in Spectrochimica Acta Part B: Atomic Spectroscopy
- Vol. 52 (7) , 887-899
- https://doi.org/10.1016/s0584-8547(96)01662-x
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Development of a High Sensitivity TXRF with a Novel Monochromator Having Three Selectable CrystalsPublished by Springer Nature ,1995
- X-Ray Spectrometry in Electron Beam InstrumentsPublished by Springer Nature ,1995
- THE INFLUENCE OF CHEMICAL BONDING ON THE LOW-ENERGY Kα SPECTRUM OF SILICONLe Journal de Physique Colloques, 1971