Low-Temperature Photomagnetoelectric Properties of Gold-Doped-Type Silicon
- 15 September 1970
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 2 (6) , 1847-1851
- https://doi.org/10.1103/physrevb.2.1847
Abstract
The photomagnetoelectric (PME) effect was observed between 21 and 84°K in silicon doped with gold and phosphorus. A generalized diffusion equation is formulated and solved with the impurity centers included in the charge-balance equation and arbitrary intensity of steady illumination. When the carrier densities are much smaller than the gold density, the charged impurities maintain charge neutrality, and this results in a range of injection where . If the quadratic term dominates, the PME current is proportional to the power of the photoconductance. This power law is observed in our measurements, from which we deduce values for the product between 36 nsec and 63 μsec.
Keywords
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