Abstract
We show how the intensity enhancement of angle-resolved x-ray photoelectrons along the emitter-scatterer internuclear directions can be used to monitor layer-by-layer growth of Co on Cu(111). Specifically, we show how the technique can distinguish between fcc or hcp growth and determine precisely the thickness at which the fcc stacking switches to hcp. We also show how the interference patterns around each forward-focusing direction can be used to produce real-space images of nearest-neighbor atoms in the atomic plane above the emitting atom.