Chemical amplification of resist lines (CARL)
- 30 April 1990
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 11 (1-4) , 531-534
- https://doi.org/10.1016/0167-9317(90)90164-o
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- Optical lithography and O2/RIE pattern transfer characteristics of the silicon-containing positiv resist (SPR)Microelectronic Engineering, 1989
- Mask bias in submicron optical lithographyJournal of Vacuum Science & Technology B, 1988
- Lithographic, Photochemical And O 2 RIE Properties Of Three Polysilane CopolymersPublished by SPIE-Intl Soc Optical Eng ,1988
- Positive Near-UV Resist For Bilayer LithographyPublished by SPIE-Intl Soc Optical Eng ,1987