Optical lithography and O2/RIE pattern transfer characteristics of the silicon-containing positiv resist (SPR)
- 1 May 1989
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 9 (1-4) , 547-550
- https://doi.org/10.1016/0167-9317(89)90117-2
Abstract
No abstract availableKeywords
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