Reaction mechanisms for the photon-enhanced etching of semiconductors: An investigation of the UV-stimulated interaction of chlorine with Si(100)
- 1 October 1986
- journal article
- Published by Elsevier in Surface Science
- Vol. 176 (1-2) , 183-192
- https://doi.org/10.1016/0039-6028(86)90171-8
Abstract
No abstract availableThis publication has 14 references indexed in Scilit:
- Thermal desorption of gasesPublished by Elsevier ,2002
- Photoeffects on the fluorination of silicon. I. Influence of doping on steady-state phenomenaThe Journal of Chemical Physics, 1983
- Laser Microchemistry and its Application to Electron-Device FabricationAnnual Review of Physical Chemistry, 1983
- Chemisorption and epitaxial growth: structural and kinetic studies of halogen interactions with vanadium and chromium surfacesVacuum, 1983
- Chemisorptive emission and luminescence: II. Electron and ion emission from chlorine and bromine reactions with yttrium, titanium, zirconium and hafnium surfacesSurface Science, 1983
- Surface processes in plasma-assisted etching environmentsJournal of Vacuum Science & Technology B, 1983
- Laser-induced gas-surface interactionsSurface Science Reports, 1983
- Adsorption-desorption properties and surface structural chemistry of chlorine on Cu(111) and Ag(111)Surface Science, 1977
- Chemical relaxation molecular beam studies of reactive gas-solid scatteringSurface Science, 1971
- Chlorine reactions on the Si (111) surfaceSurface Science, 1969