Preparation and compositional analysis of sputtered TaN films
- 1 October 1978
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 49 (10) , 5284-5287
- https://doi.org/10.1063/1.324428
Abstract
TaNx films have been prepared by reactive sputtering at substrate temperatures of 20, 250, 500, and 750 °C. The structure of the films has been studied by x‐ray diffraction. The nitrogen portion of the compound has been determined by the nuclear reaction 14N(d,α)12C, whereas the amount of tantalum has been measured by Rutherford ion backscattering. Depending on the preparation conditions, superconductivity transition temperatures up to 10.8 °K have been observed. The ratio Ta/N of the superconducting films has been found to be between 0.9 and 1.1 and will be attributed to the fcc TaN phase.This publication has 10 references indexed in Scilit:
- The structure and composition of rf reactively sputtered MoSx filmsJournal of Applied Physics, 1978
- Superconducting transition temperatures of reactively sputtered films of tantalum nitride and tungsten nitrideJournal of Vacuum Science and Technology, 1975
- Superconductivity transition temperatures of rf reactively sputtered NbN FilmsJournal of Applied Physics, 1973
- Analysis of sputtering discharge by optical and mass spectrometry. II. Platinum and tantalum sputtered in argon/nitrogen mixturesJournal of Applied Physics, 1973
- Effect of nitrogen on the electrical and structural properties of triode-sputtered tantalum filmsJournal of Applied Physics, 1972
- Microanalysis by the direct observation of nuclear reactions using a 2 MeV Van de GraaffNuclear Instruments and Methods, 1971
- Structure of Tantalum NitridesJapanese Journal of Applied Physics, 1971
- Preparation, Structure, and Properties of Sputtered, Highly Nitrided Tantalum FilmsJournal of Applied Physics, 1968
- A NEW STRUCTURE IN TANTALUM THIN FILMSApplied Physics Letters, 1965
- Superconducting Thin Films of Niobium, Tantalum, Tantalum Nitride, Tantalum Carbide, and Niobium NitrideJournal of the Electrochemical Society, 1964