Advances in cathodic arc technology using electrons extracted from the vacuum arc
- 3 December 1993
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 61 (1-3) , 305-309
- https://doi.org/10.1016/0257-8972(93)90243-h
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Relations between plasma properties and properties of thin copper films produced by an anodic vacuum arcMaterials Science and Engineering: A, 1991
- Reduction in macroparticles during the deposition of TiN films prepared by arc ion platingSurface and Coatings Technology, 1990
- The anodic vacuum arc. II. Experimental study of arc plasmaJournal of Vacuum Science & Technology A, 1988
- Fast deposition of metallurgical coatings and production of surface alloys using a pulsed high current vacuum arcThin Solid Films, 1986