Silicon dioxide masking of phosphorus diffusion in silicon
- 31 May 1975
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 18 (5) , 399-406
- https://doi.org/10.1016/0038-1101(75)90041-6
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
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- Diffusion of Boron in Silicon through Oxide LayerJapanese Journal of Applied Physics, 1962
- Effect of Oxide Layers on the Diffusion of Phosphorus into SiliconJournal of Applied Physics, 1960
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- Diffusion of Impurities into Evaporating SiliconJournal of Applied Physics, 1959
- Surface Protection and Selective Masking during Diffusion in SiliconJournal of the Electrochemical Society, 1957