The development of silicon‐containing oxides during the oxidation of iron‐chromium‐base alloys
- 1 September 1987
- journal article
- research article
- Published by Wiley in Materials and Corrosion
- Vol. 38 (9) , 521-531
- https://doi.org/10.1002/maco.19870380910
Abstract
No abstract availableKeywords
This publication has 25 references indexed in Scilit:
- Influence of ion implantation on the microstructure of oxide scales formed on a 20Cr/25Ni/Nb-stabilized stainless steel in carbon dioxide at 825° CJournal of Materials Science, 1987
- The transport of oxygen to the advancing internal oxide front during internal oxidation of nickel-base alloys at high temperatureSolid State Ionics, 1984
- A Model for Oxidation of Silicon by OxygenJournal of the Electrochemical Society, 1981
- Modification of the oxidation behavior of high-purity austenitic Fe-14Cr-14Ni by the addition of siliconOxidation of Metals, 1976
- Thermal Oxidation of Silicon: In Situ Measurement of the Growth Rate Using EllipsometryJournal of the Electrochemical Society, 1975
- Electrical Conduction at Elevated Temperatures in Thermally Grown Silicon Dioxide FilmsJournal of the Electrochemical Society, 1973
- Oxidation of Ni-Cr-Al Alloys Between 1000° and 1200°CJournal of the Electrochemical Society, 1971
- Scaling of Fe-26Cr Alloys at 870°–1200°CJournal of the Electrochemical Society, 1965
- Preparation of Thin Mullite FilmsJournal of the American Ceramic Society, 1963
- Effect of an Electric Field on the Oxidation of ZincJournal of the Electrochemical Society, 1963