Linear birefringence measurement instrument using two photoelastic modulators
- 1 May 2002
- journal article
- Published by SPIE-Intl Soc Optical Eng in Optical Engineering
- Vol. 41 (5) , 981
- https://doi.org/10.1117/1.1467667
Abstract
No abstract availableThis publication has 19 references indexed in Scilit:
- Achieving low-wavefront specifications for DUV lithography: impact of residual stress in HPFS fused silicaPublished by SPIE-Intl Soc Optical Eng ,2001
- Dual Polarization Modulation: A Real-Time, Spectral-Multiplex Separation of Circular Dichroism from Linear Birefringence Spectral IntensitiesApplied Spectroscopy, 2000
- Behavior of fused silica irradiated by low level 193 nm excimer laser for tens of billions of pulsesJournal of Non-Crystalline Solids, 2000
- Measurement of residual birefringence in photomask blanksPublished by SPIE-Intl Soc Optical Eng ,1999
- A new instrument for measuring both the magnitude and angle of low level linear birefringenceReview of Scientific Instruments, 1999
- Polarimetry of motional Stark effect and determination of current profiles in DIII-D (invited)Review of Scientific Instruments, 1992
- Magnetic field pitch angle diagnostic using the motional Stark effect (invited)Review of Scientific Instruments, 1990
- The optical polarization of the Sun measured at a sensitivity of parts in ten millionNature, 1987
- Automatic measurement of the Stokes vector of lightApplied Optics, 1979
- Piezo-Optical Birefringence Modulators: New Use for a Long-Known EffectJournal of the Optical Society of America, 1969