Phase formation sequence and domain structure: A low-energy-electron-microscopy study of the Si(111)-(√3 × √3 )Ag surface

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Abstract
Changes in nucleation and phase formation sequence with temperature may strongly affect the morphology of the final phase. The Si(111)-(√3 × √3 )Ag structure develops directly from the clean (7×7) structure at lower temperatures (500–700 K). Preferred nucleation at step edges and (7×7) domain boundaries reduces the effective dimensionality of the substrate and explains anomalies in domain size scaling observed by Zuo and Wendelken. An intermediate three-domain (3×1) structure precedes the √3 structure at higher temperatures, leading to a complete change in √3 nucleation and growth, as well as final domain size distribution and total Ag coverage.