Effect of plasma activation on the phase transformations of aluminum oxide
- 31 December 1995
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 76-77, 754-762
- https://doi.org/10.1016/0257-8972(95)02549-9
Abstract
No abstract availableKeywords
This publication has 14 references indexed in Scilit:
- Phase transformation in chemically vapour-deposited κ-aluminaThin Solid Films, 1992
- Space-group determination and structure model for κ-Al2O3 by convergent-beam electron diffraction (CBED)Acta crystallographica Section B, Structural science, crystal engineering and materials, 1991
- Ion-beam-assisted deposition of Al2O3 thin filmsSurface and Coatings Technology, 1991
- Properties of Al2O3 thin films prepared by ion-assisted evaporationThin Solid Films, 1991
- A review of the present state of art in hard coatings grown from the vapor phaseJournal of Vacuum Science & Technology A, 1986
- Deposition of aluminum oxide film by an activated reactive evaporation process.Journal of the Metal Finishing Society of Japan, 1985
- Alumina deposition by activated reactive evaporationThin Solid Films, 1977
- Physical and Chemical Properties of Aluminum Oxide Film Deposited by AlCl3-CO2-H2SystemJapanese Journal of Applied Physics, 1972
- Transitions in Vapor‐Deposited Alumina from 300° to 1200°CJournal of the American Ceramic Society, 1967
- Phase Changes in Thin Reactively Sputtered Alumina FilmsJournal of the Electrochemical Society, 1966