Argon bubble formation in the sputtering of PtSi
- 1 June 1978
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 32 (11) , 716-718
- https://doi.org/10.1063/1.89896
Abstract
Argon bubble formation has been observed by Rutherford backscattering spectrometry and cross‐sectional transmission electron microscopy in PtSi sputtered by Ar ions of 20–160 keV. The backscattering data show the bubble formation process to be repetitive. This phenomenon is interpreted in terms of Ar release due to the sputter etching.Keywords
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