The sputtering of PtSi and NiSi
- 1 February 1976
- journal article
- Published by Elsevier in Nuclear Instruments and Methods
- Vol. 132, 345-349
- https://doi.org/10.1016/0029-554x(76)90756-4
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Structure and growth kinetics of Ni2Si on siliconThin Solid Films, 1975
- Kinetics and mechanism of platinum silicide formation on siliconApplied Physics Letters, 1974
- The stopping of 4He ions in elemental matterThin Solid Films, 1973
- Range and stopping-power tables for heavy ionsAtomic Data and Nuclear Data Tables, 1970
- Simultaneous Measurement of Sputtered Constituents of Cu3AuJournal of Applied Physics, 1969
- The penetration of positive ions of low energy into alloys and composition changes produced in them by sputteringJournal of Physics and Chemistry of Solids, 1959