Recoil implantation of antimony into silicon by argon ion bombardment
- 1 March 1985
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 7-8, 316-320
- https://doi.org/10.1016/0168-583x(85)90572-5
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
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- Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline TargetsPhysical Review B, 1969