4He-stopping power measurements by using ion implantation and backscattering techniques
- 1 January 1980
- journal article
- research article
- Published by Taylor & Francis in Radiation Effects
- Vol. 47 (1-4) , 73-80
- https://doi.org/10.1080/00337578008209190
Abstract
(1980). 4He-stopping power measurements by using ion implantation and backscattering techniques. Radiation Effects: Vol. 47, No. 1-4, pp. 73-80.Keywords
This publication has 3 references indexed in Scilit:
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- Range parameters of heavy ions in amorphous targets at LSS-energies of 0.0006⩽ ϵ ⩽ 0.3Physics Letters A, 1975
- The application of high resolution rutherford backscattering to the measurement of ion ranges in Si and AlRadiation Effects, 1975