Sustaining mechanisms in rf plasmas
- 1 March 1984
- Vol. 34 (3-4) , 357-364
- https://doi.org/10.1016/0042-207x(84)90067-8
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- The rf voltage/current characteristics and related de negative bias properties of an electrotech flat bed plasma etcherVacuum, 1982
- Ion response to plasma excitation frequencyJournal of Applied Physics, 1981
- Langmuir probe studies of the glow discharge in an rf sputtering system at various frequenciesVacuum, 1979