A study of heterogeneous niobium carbonitride thin films deposited by reactive sputtering
- 15 October 1982
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 96 (3) , 191-198
- https://doi.org/10.1016/0040-6090(82)90243-7
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Propriétés et structure des couches minces de nitrure de niobium élaborées par pulvérisation cathodique réactive. II. Etude cristallographique par microscopie et diffraction électroniquesJournal of the Less Common Metals, 1974
- Propriétés et structure des couches minces de nitrure de niobium élaborées par pulvérisation cathodique réactive I. Élaboration et propriétésJournal of the Less Common Metals, 1974
- Superconducting Properties and Structure of Reactively Sputtered Niobium Carbide Thin FilmsJournal of Vacuum Science and Technology, 1973
- The Preparation of Thin Films of B-1 Structure Superconducting Ternary CompoundsJournal of Vacuum Science and Technology, 1973
- Superconducting Transition Temperatures of Vapor-Deposited Niobium NitrideJournal of Vacuum Science and Technology, 1970