Determination of boron range distribution in ion-implanted silicon by the10B(n, α)7 Li reaction
- 1 March 1977
- journal article
- Published by Springer Nature in Journal of Radioanalytical and Nuclear Chemistry
- Vol. 38 (1) , 19-27
- https://doi.org/10.1007/bf02520179
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- MENC newsMusic Educators Journal, 1976
- Measurement of the boron distribution in 10B-implanted silicon by the (n,α) nuclear reactionThin Solid Films, 1973
- Technique for determining concentration profiles of boron impurities in substratesJournal of Applied Physics, 1972
- Range and stopping-power tables for heavy ionsAtomic Data and Nuclear Data Tables, 1970