A novel technology for a-Si TFT-LCD's with buried ITO electrode structure
- 1 July 1994
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 41 (7) , 1120-1124
- https://doi.org/10.1109/16.293338
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Performance of Ion-Doped Self-Aligned a-Si TFT for AMLCDs.The Journal of the Institute of Television Engineers of Japan, 1993
- Modeling of defects in integrated circuit photolithographic patternsIBM Journal of Research and Development, 1984