Nitrogen-doped tantalum thin film capacitors with improved temperature stability
- 1 May 1975
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 27 (1) , 135-140
- https://doi.org/10.1016/0040-6090(75)90015-2
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Untersuchungen an Ta2N-oxid-schichtenThin Solid Films, 1973
- The Correlation Between Temperature Coefficient of Capacitance and Dielectric Loss in Tantalum and Tantalum-Aluminum Anodic OxidesJournal of the Electrochemical Society, 1972
- Structure of Tantalum NitridesJapanese Journal of Applied Physics, 1971
- Properties of Anodic Films Formed on Reactively Sputtered TantalumJournal of the Electrochemical Society, 1966