Hole impact ionization enhancement in AlxGa1−xSb
- 1 March 1990
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 67 (5) , 2488-2493
- https://doi.org/10.1063/1.345499
Abstract
The threshold energy and scattering rate for impact ionization in AlxGa1−xSb have been calculated for compositions x near the value where the spin‐orbit‐split gap Δ equals the band gap Eg. We have found that a minimum in the threshold energy for impact ionization near the Δ=Eg composition cannot explain the enhancement of the hole ionization coefficient, although it has been proposed as a possible mechanism. Rather, an increased scattering rate is responsible for this enhancement. It is caused by a minimum change of momentum in the hole ionization near the threshold and the mixing of an s‐like state into the valence‐like state induced by a composition disorder in this ternary compound. Our results indicate that the maximum hole ionization coefficient will occur at a composition x that lies between zero and the composition at which Δ=Eg.This publication has 16 references indexed in Scilit:
- Bandgap spin-orbit splitting resonance effects in Hg1-xCdxTe alloysJournal of Crystal Growth, 1982
- Impact ionization in Ga1-xAlxSb: An alternative interpretationIEEE Journal of Quantum Electronics, 1981
- Ga1-xAlxSb avalanche photodiodes: Resonant impact ionization with very high ratio of ionization coefficientsIEEE Journal of Quantum Electronics, 1981
- The band structure dependence of impact ionization by hot carriers in semiconductors: GaAsSolid-State Electronics, 1978
- Spin-orbit splitting in crystalline and compositionally disordered semiconductorsPhysical Review B, 1977
- Threshold Energies for Electron-Hole Pair Production by Impact Ionization in SemiconductorsPhysical Review B, 1972
- Electron Scattering by Pair Production in SiliconPhysical Review B, 1967
- Energy-Band Structure of Germanium and Silicon: The k·p MethodPhysical Review B, 1966
- Problems related to p-n junctions in siliconSolid-State Electronics, 1961
- Band structure of indium antimonideJournal of Physics and Chemistry of Solids, 1957