Rapid thermal chemical vapour deposition of SiOxNy films
- 1 January 1992
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 54, 125-129
- https://doi.org/10.1016/0169-4332(92)90031-r
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Photo-assisted deposition of thin films on III–V semiconductors with UV and IR lampsApplied Surface Science, 1990
- Light Assisted CVD For Thin Dielectric Film DepositionPublished by SPIE-Intl Soc Optical Eng ,1989
- The preparation, characterization and applications of silicon nitride thin filmsThin Solid Films, 1980