(TiCr)N coatings deposited by cathodic vacuum arc evaporation
- 1 September 1995
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 74-75, 286-291
- https://doi.org/10.1016/0257-8972(95)08350-2
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Deposition and characterisation of arc-bond sputter TixZryN coatings from pure metallic and segmented targetsSurface and Coatings Technology, 1995
- The architecture and performance of multilayer and compositionally gradient coatings made by cathodic arc evaporationSurface and Coatings Technology, 1993
- Deposition of graded alloy nitride films by closed field unbalanced magnetron sputteringSurface and Coatings Technology, 1993
- A comparison of Magnetron Sputtered and Arc Evaporated PVD thin films for wear applications in multipoint cutting toolsJournal of Materials Processing Technology, 1992
- Properties of (Ti1−xAlx)N coatings for cutting tools prepared by the cathodic arc ion plating methodJournal of Vacuum Science & Technology A, 1992
- Characterization of PVD (Ti, Cr)Nx hard coatingsSurface and Coatings Technology, 1991
- Beitrag zur Kenntnis der Systeme Titan?Chrom?Stickstoff, Zirkonium?Chrom?Stickstoff und Hafnium?Chrom?StickstoffMonatshefte für Chemie / Chemical Monthly, 1971