Deposition of graded alloy nitride films by closed field unbalanced magnetron sputtering
- 1 October 1993
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 59 (1-3) , 21-25
- https://doi.org/10.1016/0257-8972(93)90049-t
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- Reactive deposition of hard coatingsSurface and Coatings Technology, 1989
- Activation of reactive sputtering by a plasma beam from an unbalanced magnetronVacuum, 1988
- A magnetron sputter ion plating systemSurface and Coatings Technology, 1988
- Charged particle fluxes from planar magnetron sputtering sourcesJournal of Vacuum Science & Technology A, 1986