Radio frequency sheath characteristics in a plasma sputtering system
- 1 April 1992
- Vol. 43 (4) , 287-290
- https://doi.org/10.1016/0042-207x(92)90156-q
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- A self-compensating Langmuir probe for use in rf (13.56 MHz) plasma systemsVacuum, 1991
- Langmuir probe studies of oxygen and chlorine discharges in a 13.56 MHz plasma reactorVacuum, 1991
- Plasma diagnostic studies for reactive ion etching systemsVacuum, 1988
- Langmuir probe and optical emission spectroscopic studies of Ar and O2 plasmasVacuum, 1987
- Distribution of ion energies incident on electrodes in capacitively coupled rf dischargesJournal of Applied Physics, 1985
- Plasma potentials of 13.56-MHz rf argon glow discharges in a planar systemJournal of Applied Physics, 1985
- Application of RF Discharges to SputteringIBM Journal of Research and Development, 1970
- Characteristics of the Plasma Resonance ProbeJournal of Applied Physics, 1964
- Radio frequency characteristics of the plasma sheathPhysics Letters, 1964
- Ion Energies at the Cathode of a Glow DischargePhysical Review B, 1963