Oxide-thickness determination in thin-insulator MOS structures
- 1 April 1988
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 35 (4) , 432-438
- https://doi.org/10.1109/16.2476
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
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