Time Variation of Plasma Properties in a Pulse-Time-Modulated Electron Cyclotron Resonance Discharge of Chlorine Gas
- 1 August 1995
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 34 (8B) , L1079-1082
- https://doi.org/10.1143/jjap.34.l1079
Abstract
Time dependence of plasma parameters in a pulse-time-modulated electron cyclotron resonance plasma of Cl2 and Ar gases is measured. It is found that Cl2 plasma produces a large quantity of negative ions during afterglow and that decay times of electron density, electron temperature and sheath potential of Cl2 plasma are much smaller than those of Ar plasma. The results suggest that the pulse modulation of Cl2 plasma changes the flow of charged particles through the sheath region to the substrate surface and enables us to improve highly selective and charge-free poly-Si patterning.Keywords
This publication has 5 references indexed in Scilit:
- Pulse-time-modulated electron cyclotron resonance plasma etching for highly selective, highly anisotropic, and notch-free polycrystalline silicon patterningApplied Physics Letters, 1994
- Highly Selective and Highly Anisotropic SiO2 Etching in Pulse-Time Modulated Electron Cyclotron Resonance PlasmaJapanese Journal of Applied Physics, 1994
- Time-modulated electron cyclotron resonance plasma discharge for controlling generation of reactive speciesApplied Physics Letters, 1993
- Plasmas with negative ions-probe measurements and charge equilibriumJournal of Physics D: Applied Physics, 1990
- Stationary Double Layers in a Collisionless MagnetoplasmaJournal of the Physics Society Japan, 1983