The effect of sputter deposition conditions on growth mechanism and microstructure of YBa2Cu3O7−x thin films on NdGaO3 substrates studied by scanning tunneling microscopy
- 31 July 1992
- journal article
- Published by Elsevier in Ultramicroscopy
- Vol. 42-44, 705-714
- https://doi.org/10.1016/0304-3991(92)90346-l
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Effect of oxygen partial pressure on the in situ growth of Y-Ba-Cu-O thin films on SrTiO3Applied Physics Letters, 1991
- Effect of oxygen pressure on the synthesis of YBa2Cu3O7−x thin films by post-deposition annealingJournal of Applied Physics, 1991
- Growth Mechanism of Sputtered Films of YBa 2 Cu 3 O 7 Studied by Scanning Tunneling MicroscopyScience, 1991
- Screw dislocations in high-Tc filmsNature, 1991
- Synthesis and properties of YBa2Cu3O7 thin films grown in situ by 90° off-axis single magnetron sputteringPhysica C: Superconductivity and its Applications, 1990
- Epitaxial and Smooth Films of a -Axis YBa 2 Cu 3 O 7Science, 1990
- Thermal analysis of rare earth gallates and aluminatesJournal of Materials Research, 1990
- I n s i t u grown YBa2Cu3O7−d thin films from single-target magnetron sputteringApplied Physics Letters, 1989