Alloying reaction in thin nickel films deposited on GaAs
- 1 July 1980
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 70 (1) , 181-189
- https://doi.org/10.1016/0040-6090(80)90426-5
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
- Alloying behavior of Ni/Au-Ge films on GaAsJournal of Applied Physics, 1980
- Structural and electrical characteristics of platinum-silicide-silicon contacts as influenced by sputter etching and annealing ambientJournal of Applied Physics, 1977
- Metallurgical and electrical properties of alloyed Ni/AuGe films on n-type GaAsSolid-State Electronics, 1975
- Effect of alloying behavior on the electrical characteristics of n-GaAs Schottky diodes metallized with W, Au, and PtApplied Physics Letters, 1973
- A topotactic reaction between nickel and gallium arsenideJournal of Applied Crystallography, 1973
- Metal-semiconductor contacts for GaAs bulk effect devicesSolid-State Electronics, 1967