High-resolution pattern definition in tungsten
- 1 November 1981
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 39 (9) , 742-743
- https://doi.org/10.1063/1.92876
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Plasma etching characteristics of sputtered MoSi2 filmsApplied Physics Letters, 1980
- X-ray zone plates fabricated using electron-beam and x-ray lithographyJournal of Vacuum Science and Technology, 1979
- X-ray lithography: Part I—Design criteria for optimizing resist energy absorption; part II—Pattern replication with polymer masksIEEE Transactions on Electron Devices, 1975