Resist image enhancement by UV-, soft vacuum pulsed electron beams and organometallic compounds
- 31 December 1987
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 6 (1-4) , 407-412
- https://doi.org/10.1016/0167-9317(87)90066-9
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- Positive-Tone Polymer Images by Surface Modification in Ion Beam ExposuresMRS Proceedings, 1985
- High Temperature Flow Resistance of Micron Sized Images in AZ ResistsJournal of the Electrochemical Society, 1981
- UV hardening of photo- and electron beam resist patternsJournal of Vacuum Science and Technology, 1981
- Developer Characteristics of Poly‐(Methyl Methacrylate) Electron ResistJournal of the Electrochemical Society, 1975