Submicron Pattern Delineation Using a Pulsed Electron-Beam in Soft Vacuum
- 1 January 1986
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- EBES: A practical electron lithographic systemIEEE Transactions on Electron Devices, 1975