Influence of Si doping on the performance of quantum dots-in-well photodetectors
- 1 May 2006
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 24 (3) , 1553-1555
- https://doi.org/10.1116/1.2190676
Abstract
The effects of doping on In As ∕ In 0.15 Ga 0.85 As quantum dots-in-well infrared photodetectors have been investigated by measuring the dark current,photocurrent,spectral response, responsivity, and detectivity. The dark current increased monotonically as a function of the doping level in the dots. The photocurrent too increased with the increase in the doping level. By measuring the background limited infrared photodetector temperature, we find that the optimum sheet doping concentration in these detectors is n = 3 × 10 10 cm − 2 (corresponding to about 1 e ∕ dot ). These results were corroborated by measurement of responsivity and generation-recombination noise limited detectivity of these detectors.Keywords
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