Divacancy annealing in Si: Influence of hydrogen

Abstract
We have performed comparative studies of divacancy (V2) annealing in hydrogenated and nonhydrogenated Si by deep level transient spectroscopy. It is shown that the nonhydrogenated samples demonstrate the formation of divacancy-oxygen (V2O) complex during annealing of V2, while the hydrogenated samples demonstrate annealing of V2 without correlated growth of electrically active centers. No substantial formation of divacancy-hydrogen (V2H) complexes is observed in the hydrogenated samples. It is suggested that the dominant mechanism of V2 annealing in hydrogen-rich Si is the interaction with hydrogen molecules (H2) that results in the formation of the V2H2 complex.