Ion implantation in InAs and InSb
- 1 January 1970
- journal article
- research article
- Published by Taylor & Francis in Radiation Effects
- Vol. 6 (1) , 149-153
- https://doi.org/10.1080/00337577008235058
Abstract
Ion implantation in InAs and InSb with sulfur and zinc ions has been used to fabricate p-n junction diodes which have been characterized for their infrared detector properties. Planar mosaic infrared detectors have been produced in both materials with good characteristics. Blackbody detectivities (D∗BB) of 2 × 109 cm Hz1/3/ watt and 4 per cent uniformity have been measured for InAs. Similarly, InSb has shown D∗BB values of 1.3 × 1010 cm Hz1/2/watt and 49 per cent uniformity between elements in an array. Experimental range-energy data for zinc in InSb has been obtained between 0.2 and 1.8 MeV and compared with predicted values from the LSS theory. Theory predicts a deeper range than experimental values indicate; however, the differences are sufficiently small to make the curves useful for device design. The slopes of the curves indicate that a large component of nuclear stopping predominates in this energy region.Keywords
This publication has 3 references indexed in Scilit:
- Ion implantation in semiconductors—Part I: Range distribution theory and experimentsProceedings of the IEEE, 1968
- Junction delineation by anodic oxidation in InSb (As, P)Solid-State Electronics, 1967
- STANDARD PROCEDURE FOR TESTING INFRARED DETECTORS AND FOR DESCRIBING THEIR PERFORMANCEPublished by Defense Technical Information Center (DTIC) ,1960